衬底对CVD生长石墨烯的影响研究

SUBSTRATES FOR CVD GROWTH OF GRAPHENE RESEARCH

  • 摘要: 石墨烯有独特的结构和优异的性能,在电子、信息、能源、材料和生物医药等领域都有着广阔的应用前景。为了更好的应用这种新型材料,如何大规模可控合成高质量石墨烯是一个必须克服的困难。相比与机械剥离法、化学氧化还原法和碳化硅表面外延生长法,化学气相沉积法(CVD)因其可以生长大面积高质量连续石墨烯膜而倍受关注。基于石墨烯的生长机理,从衬底材料的角度,综述了近几年衬底对CVD生长石墨烯的影响的研究进展。展望了衬底选择的发展新趋势。

     

    Abstract: Graphene has a unique structure and excellent properties. It has broad application prospects in electronics,information,energy,materials and biomedicine and other fields. For a better application of this new material,how large qualitycontrolled synthesis of grapheme is a necessary overcome difficulties. Compared with the mechanical exfoliation,chemical oxidation-reduction and epitaxial growth on SiC,chemical vapor deposition(CVD) method has been receiving significant attention because of it can grow high-quality large-area grapheme films. Based on the growth mechanism of grapheme,the recent substrates for CVD growth of grapheme research from the perspective of the substrate material is reviewed. Finally,the development of new trends in substrate selection are prospected.

     

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