氢等离子体与水合肼还原氧化石墨烯电容性能的比较

COMPARISON OF HYDROGEN PLASMA AND HYDRAZINE HYDRATE REDUCING GRAPHENE OXIDE FOR CAPACITIVE PERFORMANCE

  • 摘要: 分别通过氢等离子体和水合肼对氧化石墨烯进行还原处理,制成两种不同的还原型氧化石墨烯。采用透射电子显微镜、X射线粉末衍射仪和拉曼光谱对其形貌和结构进行表征。根据循环伏安、恒电流充放电和电化学阻抗谱,并比较在1 mol/L硫酸中的超级电容性能。结果表明,水合肼还原可以形成良好的三维结构,增强石墨烯的离子扩散能力,并且还原程度高。氢等离子体还原耗时少、安全可靠,减少在还原过程中对石墨烯片层结构造成损害。当充放电电流密度为1 A/g时,氢等离子体还原氧化石墨烯的比电容值可以达到178 F/g,而水合肼还原氧化石墨烯比电容值达到了119 F/g。

     

    Abstract: Two different kinds of reduced graphene oxide was prepared through hydrogen plasma and hydrazine hydrate reducing graphene oxide.The morphology and structure of reduced graphene oxide was characterized by Transmission Electron Microscope(TEM),X-Ray Powder Diffraction and Raman spectrum.The capacitive performance of reduced graphene oxide was investigated by cyclic voltammetry,galvanostatic charging-discharging and electro-chemical impedance spectroscopy.The result shows that Hydrazine hydrate reduction can make the product form favorable three dimensional structure,which can enhance the ion transportation ability of graphene.And the degree of reduction is high.Hydrogen plasma reduction,which needs less time,safe and reliable,can reduce the structure destruction during the reduction process.When the charging-discharging current density is 1 A/g,the specific capacitance of hydrogen plasma reducing graphene oxide can reach 178 F/g,while the specific capacitance of hydrazine hydrate reducing graphene is 119 F/g.

     

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