MgO薄膜的制备方法及工艺条件对薄膜特性的影响

详细信息

GROWTH METHODS AND INFLEUNCE OF CONDITIONS ON PROPERTIES OF MgO THIN FILMS

State Key Laboratory for Materials Modification by Laser, Ion, Electron Beams and Department of Physics, Dalian University of Technology, Dalian 116024, China

摘要: 综述了MgO薄膜的主要制备方法,包括电子束蒸发、脉冲激光沉积、磁控溅射、金属有机物化学气相沉积、分子束外延和溶胶-凝胶法等。阐述了各种方法在制备MgO薄膜方面的优点和不足,重点讨论了不同的生长条件对薄膜结晶取向、表面形貌等性质的影响。
- 制备方法 ;
- MgO薄膜 ;
- 结晶取向 ;
- 表面形貌
Abstract: The main methods of preparing MgO thin films,including Electron-beam evaporation,PLD,Magn-etron sputtering,MOCVD,MBE and Sol-gel were reviewed.The advantages and shortcomings of these methods in MgO film preparation are represented.The effects of different growth conditions on crystalline orientations and surf-ace morphology of MgO thin film are discussed.
- method /
- MgO thin film /
- crystalline orientation /
- surface morphology