沉积气压对MW-PCVD制备金刚石薄膜的影响

详细信息

INFLUENCES OF DEPOSITION PRESSURE ON MW—PCVD DIAMOND FILM

摘要: 利用石英钟罩式微波等离子体化学气相沉积(MW-PCVD)实验装置研究了不同沉积气压对金刚石薄膜沉积结果的影响。扫描电子显微镜(SEM)显微形貌观察及喇曼光谱(RAMAN)分析表明沉积气压的提高有利于改善MW-PCVD制备金刚石薄膜的质量。
- 微波等离子体化学气相沉积 ;
- 金刚石薄膜 ;
- 沉积气压
Abstract: The diamond films were deposited in a quartz bell jar type microwave plasma chemical vapour deposition （MW—PCVD） research device. The influence of different deposition pressures on diamond film were characterized by scanning electron microscopy （SEM） and Raman spectroscopy. From the results it was found that increasment of deposition pressure was benefical to improving the quality of diamond films.
- Microwave plasma chemical vapour deposition /
- Diamond film /
- Deposition pressure