制备ITO薄膜的磁控反应溅射镀膜设备的研制
THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM
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摘要: 提出了制备氧化铟锡薄膜(ITO)的磁控反应溅射镀膜设备的关键部件的设计原则。给出了该设备的调试结果。Abstract: The design ruling on the key parts of the magnetron reactive sputtering coating equipment for preparation of ITO film has been introduced in the paper.The test results of the coating equipment have been given.
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