磁控溅射沉积二氧化钒薄膜及其电致相变特性研究

VANADIUM DIOXIDE THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING AND ITS PHASE TRANSITION INDUCED BY ELECTRIC-FIELD

摘要: 采用反应射频磁控溅射技术在熔融石英玻璃衬底上制备了组分单一的二氧化钒薄膜。在制备好的二氧化钒薄膜上使用半导体工艺制备了金属叉指电极,通过半导体测试仪测试其电致相变特性。结果表明,当电极上所加电压达到一定阈值时电流发生突变,即薄膜发生半导体-金属相变。

Abstract: vanadium dioxide thin films on fused quartz glass have been prepared directly by reactive magnetron sputtering methods.The electrodes were fabricated on the thin films using well-established semiconductor techniques,and an abrupt semiconductor-metal phase transition（SMPT） was observed in vanadium thin films when a static voltage applied onto the electrodes.