多弧物理气相沉积技术制备(TiAl) N超硬膜

DEVELOPMENT OF （TiAl）N ADVANCED FILMS BY PVD ARC PROCESS

摘要: 主要介绍采用多弧物理气相沉积(PVD)技术研制新型(TiAl) N超硬膜的工艺技术特点。对其膜层相结构、化学成分、显微组织等方面做了分析研究。结合工业生产实际应用进行了(TiAl) N与TiN涂层刀具切削耐用度对比试验。

Abstract: This paper reviews the characteristics of （TiAl）N advanced films by PVD arc process.The structure,composition and surface morphology of （TiAl）N films were studied.And the comparison between the performance of the cutting tools coated with TiN that coated with （TiAl）N is made.