高响应度Al0.1Ga0.9N薄膜紫外探测器研究

STUDY OF HIGH RESPONSIVITY ULTRAVIOLET DETECTOR ON Al0.1Ga0.9N FILM

  • 摘要: 在有机金属化学气相沉积的Al0.1Ga0.9N薄膜上设计并制作了光导型的紫外探测器。测试表明在波长为345nm光照下器件具有峰值响应度1050A/W,说明Al0.1Ga0.9N薄膜的禁带宽度被调至3.6eV,与计算结果吻合。在时间响应测试中,器件表现出持续光电导(PPC)现象,这使得器件的响应时间延长,然而,器件中可能存在的陷阱效应能够降低载流子复合几率,延长载流子寿命,从而导致了器件的高响应度,这将有利于器件在静态目标的高灵敏度探测领域的应用。

     

    Abstract: A photoconductive ultraviolet detector has been fabricated on the surface of a Al0.1Ga0.9N film deposited by metalorganic chemical vapor deposition(MOCVD).The UV detector presents a peak response of 1 050 A/W at wavelength of 345 nm,which indicates the band gap of the Al0.1Ga0.9N film was successfully regulated to 3.6 eV.Persistent photoconductivity(PPC)phenomenon was also observed in the time response measurement,appearing as prolonged response time.However,trapping effect may play an important role in reducing the carrier recombination rate and prolonging the carrier lifetime,resulting in the high responsivity in this work.Such a high responsivity UV detector has a potential application of high sensitivity detection.

     

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