金刚石镀膜装置上的等离子体漂移速度的测量
MEASUREMENT OF THE PLASMA FLOW VELOCITY ON THE DEPOSIT DIAMOND FILM DEVICE
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摘要: 主要叙述了在金刚石镀膜装置中,利用平行马赫探针测量了沉积室中的等离子体漂移速度,采用了Hutchinson的流体力学模型分析了数据。测得马赫数M为0.086,电子温度Te为5eV,等离子体漂移速度约为297m/s。在金刚石镀膜的研究中,平行马赫探针为进一步研究沉积金刚石膜的速度和质量与等离子体漂移速度的关系提供了比较好的手段。Abstract: The article discusses the use of parallel Mach probe to measure plasma flow velocity in deposit room of depositing diamond film device and the use of the fluid dynamics of Hutchinson to analyze the data.The results are:Mach number is 0.086,electron temperature is 5 eV,plasma flow velocity is 297 m/s.During the research of depositing deamond film,parallel Mach probe is a good tool for further study on the relation between plasma flow velocity and the quality and velocity of depositing diamond film.