Abstract: A sol-gelmethod is described for preparing high-quality vanadium dioxide thin films which exhibit an abrupt resistivity change of 2～3 order of magnitude at about 60℃～80℃ on non-crystal substrate .The method consists of four processes:quenching, coating,drying and vacuum heat treatment.These processes show strong effects on the properties of the final films.The effects of the drying, quenching temperature and heat treatment time on the resistivity property of the films are studied.XRD（x-ray diffraction） and XPS（x-ray photoelectron spectroscopy）are used to study valence and characteristics of the films.