用于激光直写灰度掩模的二元金属薄膜的制备及光学性质
PREPARATION AND OPTICAL PROPERTY OF BIMETALLIC THIN FILMS FOR LASER DIRECT-WRITE GRAY-LEVEL MASK
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利用磁控溅射方法制备了Zn/Al二元金属薄膜,得出了制备Zn/Al二元金属薄膜的工艺参数。论述了其在激光直写灰度掩模中的应用。Abstract: Zn/Al bimetallic thin films were prepared on glass substrate by RF magnetr-ron sputtering,and deposition parameters of Zn/Al bimetallic thin films was obtained.Applications for laser direct-write gray-level mask were also discussed.
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