真空退火对VO<i><sub>x</sub></i>薄膜相结构及表面形貌的影响

真空退火对VO_x薄膜相结构及表面形貌的影响

摘要: 以V₂O₅粉末为原料,采用无机溶胶-凝胶法制备了V₂O₅凝胶膜,经过真空退火处理得到了以VO₂为主的薄膜。利用X射线衍射(XRD)和原子力显微镜(AFM)对不同实验条件下得到的薄膜的物相和表面形貌进行分析,得出了VO_x薄膜相结构及表面形貌与真空退火条件之间的关系。

Abstract: V₂O₅ thin films were prepared by inorganic sol gel method with V₂O₅ powders. Through annealed in vacuum, the V₂O₅ thin films can be transfered to VO₂ films. X ray diffraction（XRD） and atomic force microscopy（AFM） were used to study the phase and morphology of the thin films prepared in different vacuum annealing conditions. The relationships between phases, morphology of VO_x and vacuum annealing conditions were obtained.