EFFECT OF Mo2C INTERMEDIATE LAYER ON ELECTRON FIELD EMISSION UNIFORMITY OF DIAMOND-CARBON FILMS
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WANG Xiao-ping,
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WANG Li-jun,
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SONG Tian-fu,
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YAO Ning,
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MA Hui-zhong,
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LIANG Er-jun,
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WANG Jian-en,
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CHENG Gui-ping,
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LI Guang-ting,
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YANG Shi-e,
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BIAN Chao,
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LI Hui-jun,
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ZHANG Bing-lin
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Graphical Abstract
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Abstract
The diamond -carbon films were deposited on metal Mo substrates by using microwave chemical vapor deposition（CVD）technique （Mo substrates were pretreated by special techniques）.The films were characterized by X-ray diffraction（XRD）,Raman spectrum and scanning electron microscopy（SEM）.The result of the experiments indicates that the Mo2C interfacial layers formed between Mo substrate and the diamond-carbon films.The study demonstrated a strong correlation between the field emission uniformity and the Mo2C interfacial layer.
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