STUDY OF IN SITU SILICONIZED FILM IN HL-1M TOKAMAK

WANG Mingxu, ZHANG Nianman, WANG Zhiwen, et al. STUDY OF IN SITU SILICONIZED FILM IN HL-1M TOKAMAK[J]. VACUUM AND CRYOGENICS, 1998, 4(3): 132-135.

Citation:

WANG Mingxu, ZHANG Nianman, WANG Zhiwen, et al. STUDY OF IN SITU SILICONIZED FILM IN HL-1M TOKAMAK[J]. VACUUM AND CRYOGENICS, 1998, 4(3): 132-135.

Citation:

WANG Mingxu, ZHANG Nianman, WANG Zhiwen, et al. STUDY OF IN SITU SILICONIZED FILM IN HL-1M TOKAMAK[J]. VACUUM AND CRYOGENICS, 1998, 4(3): 132-135.

Abstract

Siliconization techniqae has significantly improved the first wall conditions and confining performance of plasma in HL-1M Tokamak.In this paper, the performances of siliconized film on the first wall,and the effect on impurities and radiation in HL-1M Tokamak are described.

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