THE ELECTROCHROMIC PROPERTIES OF WO3 THIN FILMS BY DC MAGNETRON SPUTTERING
 
                 
                
                    
                                        
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Graphical Abstract
 
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Abstract
    Using pure tungsten as target,WO3 thin films were prepared on glass substrate by DC reactive magnetron sputtering.Its crystal structures were analyzed by X-ray diffraction(XRD) method.The deposition technology of the WO3 thin film was obtained.Electrochromism device of WO3/ITO/Glass was prepared and its properties were studied.The experimental results showed that the transmissivity of the WO3 thin film changed about 50% after the Li ions in jection.The device has a preferably reversible electrochromism performance,about 25% of W6+ in the WO3 thin film change to W5+.
 
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