STUDY OF THE MULTIFUNCTIONAL PSII APPARATUS FOR INDUSTRIAL APPLICATIONS
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GAN Mingle,
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TONG Honghui,
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HUO Yanfeng,
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CHEN Naxin,
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CHEN Qingchuan,
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FENG Tieming,
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MU Lilan,
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WANG Jingquan,
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XING Dazhong,
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GENG Man,
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SHANG Zhenkui
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Plasma Source Ion Implantation（PSII） is a new kind of ion implantation technique,and it can be used in a larger range when combinating with other related technologies.In this paper,the first multifunctional PSII apparatus suiting industrial applications is reported,including its structures,properties,parameters and the preliminary results of materials modification.
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