STUDY OF THE MULTIFUNCTIONAL PSII APPARATUS FOR INDUSTRIAL APPLICATIONS

GAN Mingle; TONG Honghui; HUO Yanfeng; CHEN Naxin; CHEN Qingchuan; FENG Tieming; MU Lilan; WANG Jingquan; XING Dazhong; GENG Man; SHANG Zhenkui

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VACUUM AND CRYOGENICS > 1997 > 3(2): 80-83.

GAN Mingle, TONG Honghui, HUO Yanfeng, et al. STUDY OF THE MULTIFUNCTIONAL PSII APPARATUS FOR INDUSTRIAL APPLICATIONS[J]. VACUUM AND CRYOGENICS, 1997, 3(2): 80-83.

Citation:

GAN Mingle, TONG Honghui, HUO Yanfeng, et al. STUDY OF THE MULTIFUNCTIONAL PSII APPARATUS FOR INDUSTRIAL APPLICATIONS[J]. VACUUM AND CRYOGENICS, 1997, 3(2): 80-83.

Citation:

GAN Mingle, TONG Honghui, HUO Yanfeng, et al. STUDY OF THE MULTIFUNCTIONAL PSII APPARATUS FOR INDUSTRIAL APPLICATIONS[J]. VACUUM AND CRYOGENICS, 1997, 3(2): 80-83.

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STUDY OF THE MULTIFUNCTIONAL PSII APPARATUS FOR INDUSTRIAL APPLICATIONS

Southwestern Institute of Physics, Chengdu 610041

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Received Date: January 18, 1997

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Plasma Source Ion Implantation（PSII） is a new kind of ion implantation technique,and it can be used in a larger range when combinating with other related technologies.In this paper,the first multifunctional PSII apparatus suiting industrial applications is reported,including its structures,properties,parameters and the preliminary results of materials modification.
- Ion implantation,
- Plasma application,
- Materials modification

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STUDY OF THE MULTIFUNCTIONAL PSII APPARATUS FOR INDUSTRIAL APPLICATIONS

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