MOU Yong-qiang, FENG Hao, LIANG Yao-ting, et al. CHARACTERIZATION OF VANADIUM DIOXIDE THIN FILMS BY ANNEALING[J]. VACUUM AND CRYOGENICS, 2009, 15(1): 21-24.
Citation:
MOU Yong-qiang, FENG Hao, LIANG Yao-ting, et al. CHARACTERIZATION OF VANADIUM DIOXIDE THIN FILMS BY ANNEALING[J]. VACUUM AND CRYOGENICS, 2009, 15(1): 21-24.
MOU Yong-qiang, FENG Hao, LIANG Yao-ting, et al. CHARACTERIZATION OF VANADIUM DIOXIDE THIN FILMS BY ANNEALING[J]. VACUUM AND CRYOGENICS, 2009, 15(1): 21-24.
Citation:
MOU Yong-qiang, FENG Hao, LIANG Yao-ting, et al. CHARACTERIZATION OF VANADIUM DIOXIDE THIN FILMS BY ANNEALING[J]. VACUUM AND CRYOGENICS, 2009, 15(1): 21-24.
CHARACTERIZATION OF VANADIUM DIOXIDE THIN FILMS BY ANNEALING
Vanadium dioxide thin films on quartz glass have been prepared by reactive magnetron sputtering methods and annealingprocess.Structural and electrical-optical properties have been characterized by XRD,SEM,resistance measurements and optics transmittance measurements in wavelength between 200～2 500 nm.Influence of annealing on thin film properties was given.
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