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MA Sheng-ge, WU Yu-feng, GENG Man. BLACK HARD FILMS Ti/TiN/Ti（N,C） DEPOSITED BY MF UNBALANCED TWIN TARGET MANETRON SPUTTERING[J]. VACUUM AND CRYOGENICS, 2006, 12(1): 15-18,22.
Citation: MA Sheng-ge, WU Yu-feng, GENG Man. BLACK HARD FILMS Ti/TiN/Ti（N,C） DEPOSITED BY MF UNBALANCED TWIN TARGET MANETRON SPUTTERING[J]. VACUUM AND CRYOGENICS, 2006, 12(1): 15-18,22.
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BLACK HARD FILMS Ti/TiN/Ti（N,C） DEPOSITED BY MF UNBALANCED TWIN TARGET MANETRON SPUTTERING

  • 1. National R&D center for surface engineering of China, Shenzhen, 518029, China;

  • 2. Northeastern University, Shenyang 110004, China

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  • Received Date: December 20, 2005
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  • Black hard Ti/TiN/Ti（N,C） films are deposited on different substrates by MF unbalanced twin target magnetron sputtering machine.Reflectivity of the film in the visible spectrum is beween 8.2%～10.2%.Luminance of the film is 38.01.Deposition rate of the film is about 1.21 μm/h.The sarface is smooth.The hardness of substrates greatly effect the test results of the film’s hardness.The influence will be reduced with increase hardness of substrate.The adhesion between the film and the substrate is not strength.
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